Easy mask-mold fabrication for combined nanoimprint and photolithography
نویسندگان
چکیده
منابع مشابه
A combined-nanoimprint-and-photolithography patterning technique
We propose a new lithography technique that combines the advantages of nanoimprint lithography (NIL) and photolithography. In this combined-nanoimprint-and-photolithography (CNP) technique, we introduce a hybrid maskmold made from UV transparent material and with a light-blocking metal layer placed on top of the mold protrusions. We demonstrate that the CNP method using such a hybrid mold can a...
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ژورنال
عنوان ژورنال: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
سال: 2009
ISSN: 1071-1023
DOI: 10.1116/1.3250260